关键词：晶片；晶圆；CMOS
摘 要：This report presents details of the eighth six-inch baseline run, CMOS200, where a moderately complex 0.35 μm twin-well, silicided, LOCOS process was implemented. This process was based on the previous 0.35 μm six-inch run, CMOS192. CMOS200 was the start-up run in the new Marvell NanoLab, showing the ability to fabricate operational MOSFETs, after the move from the Microlab.