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变异建模和统计参数提取CMOS器件

Variability Modeling and Statistical Parameter Extraction for CMOS Devices

作者:Kun Qian 作者单位:Electrical Engineering and Computer Sciences University of California at Berkeley 加工时间:2015-07-07 信息来源:EECS 索取原文[157 页]
关键词:半导体技术;功率/转速;电路设计
摘 要:Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dramatic improvements in power, performance and cost, year after year. Today’s advanced CMOS transistors have critical dimensions well below 24nm. This means that controlling the manufacturing process is increasingly difficult. Process and material fluctuations cause device and circuit characteristics to deviate from design goals, and introduce significant device-to-device variability due to spatial variations across silicon wafers. Accurate modeling of these spatial process variations has become critical to both foundries and circuit designers that seek optimal power/speed/area balance.
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