III-V Nanostructures on Dissimilar Substrates for Optoelectronic Applications
作者:Kar Wei Ng;Constance Chang-Hasnain 作者单位:EECS Department University of California, Berkeley 加工时间:2015-03-28 信息来源:EECS 索取原文[133 页]
关键词:光电子器件;纳米材料;III-V;InGaAs 摘 要:In this dissertation, a novel growth mechanism that yields catalyst-free, self-assembled, single-crystalline nanoneedles and nanopillars on dissimilar substrates will be presented. At CMOS-compatible growth temperatures (400 ~ 455 oC), single-crystalline InGaAs and InP nanostructures are grown on silicon and poly-silicon substrates via metalorganic chemical vapor deposition.