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铁氧体薄膜的发展促进高性能的芯片电感电路提升

Development of ferrite film facilitated high-performance on-chip inductors for GHz circuits

作者:Ranajit Sai;Navakanta Bhat;S. A. Shivashankar 作者单位:Centre for Nano Science and Engineering, Indian Institute of Science, Bangalore, India,Department of Electrical Engineering, Ibhoku University, Sendai, Japan 加工时间:2015-09-08 信息来源:科技报告(Other) 索取原文[4 页]
关键词:薄膜;电感器;射频芯片
摘 要:Integration of ferrite films on to the structures of on-chip RF inductor becomes essential for enhancement of inductance density. Here, we will demonstrate low-temperature deposition of ferrite film and its use to attain very high inductance density (680 nH/mm~2 at 5 GHz and 450 nH/mm~2 at 10 GHz).
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