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全球离子注射器市场报告(2017-2021年)

Global Ion Implanter Market 2017-2021

加工时间:2017-12-16 信息来源:EMIS 索取原文[62 页]
关键词:离子注入;引入掺杂剂;半导体;原子轰击晶片;修改材料;电导率;晶体结构
摘 要:

Ion implantation is a major process carried out to introduce dopants in a semiconductor. Implanters bombard wafers with foreign atoms to modify material properties such as conductivity or crystal structure. The main part of an implanter system is the beam path, wherein the ions are generated, concentrated, accelerated, and passed at high speed to the wafer. The conductivity of semiconductor devices such as silicon, germanium, and III-VI compounds (e.g., gallium arsenate) is altered by doping them with n or p type dopants. Out of the two methods used for doping semiconductors, diffusion and ion implantation, the diffusion was the most preferred method before the 1970s. However, doping processes by ion implantation are being preferred for IC fabrication currently.


目 录:

PART 01: Executive summary

PART 02: Scope of the report

PART 03: Research Methodology

PART 04: Introduction

Key market highlights

PART 05: Market landscape

Market overview

Market size and forecast

Five forces analysis

PART 06: Market segmentation by technology

High-current implanter

Medium-current implanter

High-energy implanter

PART 07: Geographical segmentation

APAC

Americas

EMEA

PART 08: Key leading countries

PART 09: Market drivers

Increasing demand for electronic devices

Dependence of semiconductor industry on silicon

substrates

Increasing demand for ion implants for fabrication of

plasmonic nanocomposites

Controlled growth of noble metal nanoparticles through

ion-implantation

Growth in IT sector and increasing use of ion

implantation in industrial application

PART 10: Impact of drivers

PART 11: Market challenges

Transition in transistor architecture

Need for high initial capital investment

High cost of characterization equipment

Consolidation in semiconductor industry

PART 12: Impact of drivers and challenges

PART 13: Market trends

Improvement in design structure of ion implanter

Development in plasma doping technology

Improvement in high-current dosimetry

Advances in transistor technology

PART 14: Vendor landscape

Competitive scenario

Other prominent vendors

PART 15: Key vendor analysis

Applied Materials

Axcelis Technologies

PART 16: Appendix

List of abbreviations

PART 17: Explore Technavio


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