Photomask is a fused silica quartz plate that has 6 inches square covered with pattern of opaque, transparent, and phase shifting areas. These are projected onto wafers in lithography process to express the layout of the one layer of integrated circuits. Furthermore, these sizes of the mask are typically used in lithography tools to expose 300mm and 200mm wafers. In addition, the photomask is comprised of transparent substrates including glass or fused silica that shows opaque coating on surfaces, where the microscopic pattern is fixed, and leaves some regions transparent and others opaque. The semiconductor application is expected to remain dominant on the growth of the global photomask market. Currently, almost 30% of photomasks are used by semiconductor & IC manufacturing companies. In addition, the photomask is widely used in manufacturing of hybrid circuitry, resistor network, LCDs, optical device, electron-optical devices, and MEMS.

CHAPTER 1: INTRODUCTION 

CHAPTER 2: EXECUTIVE SUMMARY 

CHAPTER 3: MARKET OVERVIEW 

CHAPTER 4: PHOTOMASK MARKET, BY PRODUCT 

CHAPTER 5: PHOTOMASK MARKET, BY MASK SHOP TYPE 

CHAPTER 6: PHOTOMASK MARKET, BY APPLICATION 

CHAPTER 7: GLOBAL PHOTOMASK MARKET, BY REGION 

CHAPTER 8: COMPETITIVE LANDSCAPE 

CHAPTER 9: COMPANY PROFILE