关键词：光致抗蚀剂；树脂；溶剂；PAC；洗去曝光；光刻程序；光致抗蚀剂显影剂
摘 要：A photoresist consists of three elements: a resin, solvents, and a PAC. A PAC enables the resin to dissolve in the developer as it is used to wash away the exposed resist after the photolithographic procedures have been performed. Photoresist materials can be either positive or negative. Positive resists are easily soluble in the photoresist developer. On the other hand, negative resists upon exposure to UV light become polymerized and thus become insoluble in photoresist developer.
目 录：

PART 01: Executive summary

Highlights

PART 02: Scope of the report

Market overview

Top-vendor offerings

PART 03: Market research methodology

Research methodology

Economic indicators

PEST analysis

PART 04: Introduction

Key market highlights

PART 05: Technology landscape

PART 06: Market landscape  

Market overview

Market size and forecast

Five forces analysis

PART 07: Market segmentation by type

Market overview

Market size and forecast

PART 08: Geographical segmentation

Market overview

Market size and forecast  

Photoresist market in APAC

Photoresist market in North America

Photoresist market in Europe

PART 09: Market drivers

Impact of drivers

PART 10: Market challenges

PART 11: Impact of drivers and challenges

PART 12: Market trends

PART 13: Vendor landscape

Competitive scenario

Key vendors

Other prominent vendors

PART 14: Key vendor analysis  

Dow

JSR

TOKYO OKHA KOGYA

PART 15: Key strategic recommendations for investors/vendors

PART 16: Appendix

List of abbreviations

PART 17: Explore Technavio