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全球光刻设备市场(2019-2027年)

Global Photolithography Equipment Market, 2019-2027

加工时间:2021-06-27 信息来源:EMIS 索取原文[225 页]
关键词:光刻;创建特定图案;工艺;光敏材料;紫外光曝光系统;半导体晶片;微电子行业
摘 要:

Photolithography, also known as optical lithography, is a process used to create specific patterns on semiconductor wafers using a photosensitive material and an ultraviolet light exposure system by transferring pattern from masks to wafers. This process can fetch a pattern into an integrated circuit using a beam of ultraviolet light without any requirement of additional materials. Photolithography controls the exact size and shape of the substrate to be patterned, making the process highly efficient and cost-effective. It has been a dominant method for patterning nanoscale features, especially in microelectronics industries.


目 录:

CHAPTER 1: INTRODUCTION 

CHAPTER 2: EXECUTIVE SUMMARY 

CHAPTER 3: MARKET OVERVIEW

CHAPTER 4: PHOTOLITHOGRAPHY EQUIPMENT MARKET, BY PROCESS

CHAPTER 5: PHOTOLITHOGRAPHY EQUIPMENT MARKET, BY APPLICATION

CHAPTER 6: PHOTOLITHOGRAPHY EQUIPMENT MARKET, BY LIGHT SOURCE

CHAPTER 7: PHOTOLITHOGRAPHY EQUIPMENT MARKET, BY REGION

CHAPTER 8: COMPETITIVE LANDSCAPE 

CHAPTER 9: COMPANY PROFILES


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