Photolithography, also known as optical lithography, is a process used to create specific patterns on
semiconductor wafers using a photosensitive material and an ultraviolet light exposure system by transferring
pattern from masks to wafers. This process can fetch a pattern into an integrated circuit using a beam of
ultraviolet light without any requirement of additional materials. Photolithography controls the exact size and
shape of the substrate to be patterned, making the process highly efficient and cost-effective. It has been a
dominant method for patterning nanoscale features, especially in microelectronics industries.